Semiconductor device and method for manufacturing semiconductor device

ABSTRACT

The present invention provides a semiconductor device including an insulating layer, a conductive layer bonded to one main surface of the insulating layer, a semiconductor element arranged such that the upper surface of the semiconductor element faces a direction same as the one main surface of the insulating layer, an upper electrode provided on the upper surface of the semiconductor element, a wiring member that has one end electrically bonded to the upper electrode of the semiconductor element and has another end electrically bonded to the conductive layer, and has a hollow portion, a first sealing material, and a second sealing material, in which the first sealing material seals at least part of the semiconductor element so as to be in contact with the semiconductor element, and the second sealing material seals the wiring member so as to be in contact with the wiring member.

TECHNICAL FIELD

The present invention relates to a semiconductor device, and forexample, to a semiconductor device that handles high frequency signals.

BACKGROUND ART

In recent years, speeding up communication of mobile communicationdevices such as mobile phones and smart phones has become a trend withthe spread of the Internet. Also, demand for safety is increasing, suchas necessity of transmission and reception of images through disasterprevention radio communication. Along with this, increasing thereliability of high frequency communication packages, which are keydevices, is urgently needed.

High frequency packages are semiconductor devices that input and outputsignals of frequencies higher than several tens of MHz, while amplifyingand matching the signals. With the demand for speeding up communication,high output of semiconductor devices is required. In a semiconductordevice with a high output, a package structure with high heatdissipation is required. In a package structure with high heatdissipation, a base plate is adopted, the base plate being obtained bybonding an insulating layer such as glass epoxy to a heat dissipationplate formed of a material, such as copper (Cu), excellent in heatdissipation.

For such a base plate, a package is formed by: cutting the glass epoxylayer by machining or the like: die-bonding a semiconductor element to ametal plate exposed in a recess of a metal base substrate; formingwiring by wire bonding; and performing resin sealing for dustproof.

The thermal expansion coefficients of silicon (Si), gallium arsenide(GaAs), silicon carbide (SiC), gallium nitride (GaN), and the like,which are substrates of semiconductor elements, are within the range ofabout 3 ppm/K to about 6 ppm/K (inclusive). These values are remarkablysmall compared to the thermal expansion coefficient (16 ppm/K) of Cuthat constitutes a base plate to be used for heat dissipation.Therefore, there is the possibility that a crack or the like may occurin a die-bonding portion where the semiconductor element and the baseplate are bonded together, due to thermal stress generated: in adie-bonding step of a manufacturing process; in temperature cycles inreliability evaluation; or the like, so that heat dissipationdeteriorates. Then, measures have been taken, the measures includingsealing the semiconductor element with a sealing material, such as anepoxy resin, in which fillers are dispersed to reinforce the die-bondingportion, for example. However, there has been the possibility that thesealing material may be peeled off the base plate since a warp is causedin the base plate due to the difference between the expansioncoefficients of the sealing material and the base plate. There is theconcern that a wire bonding portion may be damaged due to the peeling ofthe sealing material.

For example, in Patent Document 1, a method is proposed, in which theperiphery of a flip-chip mounted element and other portions are sealedwith materials having different physical properties. In Patent Document2, a method of ensuring reliability is provided, in which the peripheryof an element is sealed with hard epoxy and the whole is with a flexibleurethane resin.

PRIOR ART DOCUMENTS Patent Documents

Patent Document 1:Japanese Patent Application Laid-Open No. H10-209344(1998)

Patent Document 2:Japanese Patent Application Laid-Open No. 2006-351737

SUMMARY Problem to be Solved by the Invention

As described above, with the speeding up of communication and higheroutput of semiconductor devices, the thermal stress generated in thesemiconductor devices is also increasing. Therefore, the demand forsemiconductor devices with improved reliability against thermal stressis further increasing.

The present invention has been made in order to solve the above problem,and an object of the invention is to provide a semiconductor device withfurther improved reliability against thermal stress.

Means to Solve the Problem

The present invention provides a semiconductor device including aninsulating layer, a conductive layer bonded to one main surface of theinsulating layer, a semiconductor element arranged such that an uppersurface of the semiconductor element faces a direction same as the onemain surface of the insulating layer, an upper electrode provided on theupper surface of the semiconductor element, a wiring member that has oneend electrically bonded to the upper electrode of the semiconductorelement and has another end electrically bonded to the conductive layer,and has a hollow portion, a first sealing material, and a second sealingmaterial softer than the first sealing material, in which the firstsealing material seals at least part of the semiconductor element so asto be in contact with the semiconductor element, and the second sealingmaterial seals the wiring member so as to be in contact with the wiringmember.

Effects of the Invention

In the semiconductor device according to the present invention, thesemiconductor element is sealed with the relatively hard first sealingmaterial, and hence peeling of the semiconductor element can besuppressed. Further, the wiring member is sealed with the relativelysoft second sealing material, and hence the wiring member can beprotected from dust and thermal stress to the wiring member can bereduced even if thermal stress is applied to the circumference of thewiring member due to a warp caused in the insulating layer and theconductive layer, or the like. Therefore, the reliability of thesemiconductor device can be improved. Furthermore, in the semiconductordevice according to the present invention, the first sealing materialseals the semiconductor element so as to be in contact with thesemiconductor element, and hence the semiconductor element can beuniformly sealed. Similarly, the second sealing material seals thewiring member so as to be in contact with the wiring member, and hencethe wiring member can be uniformly sealed. Therefore, the reliability ofthe semiconductor device can be further improved.

The objects, features, aspects and advantages of the present inventionwill become more apparent from the following detailed description of thepresent invention when taken in conjunction with the accompanyingdrawings.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 is a cross sectional view of a semiconductor device according toa first embodiment.

FIG. 2 is a plan view of the semiconductor device according to the firstembodiment.

FIG. 3 is a cross sectional view of a semiconductor device according toa second embodiment.

FIG. 4 is a plan view of the semiconductor device according to thesecond embodiment.

FIG. 5 is a view illustrating a manufacturing step of the semiconductordevice according to the second embodiment.

FIG. 6 is a view illustrating a manufacturing step of the semiconductordevice according to the second embodiment.

FIG. 7 is a view illustrating a manufacturing step of the semiconductordevice according to the second embodiment.

FIG. 8 is a view illustrating a manufacturing step of the semiconductordevice according to the second embodiment.

FIG. 9 is a view illustrating a manufacturing step of the semiconductordevice according to the second embodiment.

FIG. 10 is a cross sectional view of a semiconductor device according toa third embodiment.

FIG. 11 is a plan view of the semiconductor device according to thethird embodiment.

FIG. 12 is a cross sectional view of a semiconductor device according toa variation of the third embodiment.

FIG. 13 is a cross sectional view of a semiconductor device according toa fourth embodiment.

FIG. 14 is a plan view of the semiconductor device according to thefourth embodiment.

FIG. 15 is a plan view of a semiconductor device according to a fifthembodiment.

FIG. 16 is a plan view of a semiconductor device according to a sixthembodiment.

FIG. 17 is a plan view of a semiconductor device according to a seventhembodiment.

FIG. 18 is a cross sectional view of the semiconductor device accordingto the seventh embodiment.

FIG. 19 is a plan view schematically illustrating an air bridge existingarea.

FIG. 20 is a plan view of a semiconductor device according to avariation of the seventh embodiment.

FIG. 21 is a cross sectional view of the semiconductor device accordingto the variation of the seventh embodiment.

DESCRIPTION OF EMBODIMENTS First Embodiment

FIG. 1 is a cross sectional view of a semiconductor device according toa first embodiment. FIG. 2 is a plan view of the semiconductor deviceaccording to the first embodiment. The cross section of thesemiconductor device illustrated in FIG. 1 is taken along line A-A ofFIG. 2. In FIG. 2, a second sealing material 72 and a cap 6 areillustrated by virtual lines for easy understanding of the drawing.

The semiconductor device according to the first embodiment includes aninsulating layer 32, a conductive layer 33, a heat dissipation plate 31,a semiconductor element 1, a plurality of wiring members 4, a firstsealing material 71, and the second sealing material 72. A basesubstrate 3 is composed of the heat dissipation plate 31, the insulatinglayer 32, and the conductive layer 33. The insulating layer 32 is bondedto the upper surface of the heat dissipation plate 31. The conductivelayer 33 is bonded to the upper surface of the insulating layer 32.

The plurality of the wiring members 4 include an input side wiringmember 41 and an output side wiring member 42. When the input side andthe output side are not particularly distinguished, each of them issimply described as the wiring member 4. The wiring member 4 is providedwith a hollow portion 4 a. As illustrated in FIG. 1, the hollow portion4 a is a portion that exists between portions to which both the ends ofthe wiring member 4 are respectively bonded.

The conductive layer 33 is composed of a plurality of conductivepatterns 331, 332, 333, and 334 isolated from each other. Each of theplurality of the conductive patterns 331 is provided with an externalelectrode portion 331 a to which a high frequency signal is to be input,and a wiring member bonding portion 331 b. Each of the plurality of theconductive patterns 332 is provided with a wiring member bonding portion332 a. Each of the plurality of the conductive patterns 333 is providedwith an external electrode portion 333 a that outputs a high frequencysignal.

The semiconductor element 1 is, for example, a power amplifier elementof MHz band made of Si. The semiconductor element 1 is provided, on itsupper surface, with a plurality of upper electrodes 9. The upperelectrodes 9 include an input side upper electrode 91 and an output sideupper electrode 92. When the input side and the output side are notparticularly distinguished, each of them is simply described as theupper electrode 9. The upper electrode 9 is made of an alloy containing,for example, aluminum (Al). The lower surface of the semiconductorelement 1 is bonded to the conductive pattern 334 via a bonding material2.

The input side upper electrode 91 of the semiconductor element 1 and theconductive pattern 331 are electrically bonded with the wiring member41. That is, one end of the wiring member 41 is bonded to the input sideupper electrode 91 of the semiconductor element 1, and the other end ofthe wiring member 41 is bonded to the wiring member bonding portion 331b of the conductive pattern 331. The output side upper electrode 92 ofthe semiconductor element 1 and the conductive pattern 332 areelectrically bonded with the wiring member 42. That is, one end of thewiring member 42 is electrically bonded to the output side upperelectrode 92 of the semiconductor element 1, and the other end of thewiring member 42 is electrically bonded to the wiring member bondingportion 332 a of the conductive pattern 332. In the first embodiment,the wiring member 4 is, for example, an Al wire having a diameter of0.15 mm.

Each of the plurality of the conductive patterns 332 and a correspondingone of the plurality of the conductive patterns 333 are electricallyconnected via an electronic component 5 for adjusting high frequencycharacteristics. The external electrode portion 331 a of the conductivepattern 331 is used as an external electrode of the semiconductordevice. The external electrode portion 333 a of the conductive pattern333 is used as an external electrode of the semiconductor device.

As illustrated in FIG. 1, the semiconductor element 1 is sealed with thefirst sealing material 71. The first sealing material 71 is, forexample, an epoxy resin. The expansion coefficient is adjusted to about16 ppm/K by dispersing silica fillers in the epoxy resin.

The surface of the semiconductor element 1 is sealed with the firstsealing material 71. The first sealing material 71 is in contact withthe semiconductor element 1. The upper surface of the conductive pattern334 and the bonding material 2 are also sealed with the first sealingmaterial 71. The first sealing material 71 is also in contact with theconductive pattern 334 and the bonding material 2.

The second sealing material 72 seals the wiring member 4 and thesemiconductor element 1 sealed with the first sealing material 71. Thesecond sealing material 72 is softer than the first sealing material 71.The second sealing material 72 is, for example, silicone gel. The secondsealing material 72 is in contact with the surface of the wiring member4.

The cap 6 is fixed to the conductive layer 33 with an adhesive 61 so asto cover the semiconductor element 1, the wiring member 4, the first andsecond sealing materials 71 and 72, and the like. The cap 6 is, forexample, a polyphenylene sulfide (PPS) resin. The adhesive 61 is, forexample, a silicone adhesive.

In the first embodiment, one semiconductor element 1 is arranged on theupper surface of the conductive pattern 334, but a plurality of thesemiconductor elements 1 may be arranged on the upper surface of theconductive pattern 334. The semiconductor element 1 is a high frequencypower amplifier that power amplifies a high frequency signal input viathe input side upper electrode 91 and outputs the amplified highfrequency signal from the output side upper electrode 92.

As the semiconductor element 1 to be mounted in the package of thesemiconductor device of the first embodiment, not only an element havingthe above power amplification function, but also an element having ahigh frequency signal switching function may be adopted. The highfrequency signal is a signal of a frequency higher than several tens ofMHz. The semiconductor element 1 may be, for example, a MOS-FET (MetalOxide Semiconductor) or LDMOS (Lateral double Diffused MOSFET)containing silicon. Alternatively, the semiconductor element 1 may be aGaAs-HFET (Heterostructure Field Effect Transistor) or GaAs-HBT(Heterojunction Bipolar Transistor) containing gallium arsenidephosphide that is a compound semiconductor. Alternatively, thesemiconductor element 1 may be a GaN-HFET (Heterostructure Field EffectTransistor) containing gallium nitride. A semiconductor element made ofgallium nitride, which is a wide band gap semiconductor, has variousmerits including high electron velocity, high breakdown voltage becauseof wide band gap, being capable of high power operation, wide operatingbandwidth, being capable of high temperature operation, low cost, andbeing capable of miniaturization. When a plurality of the semiconductorelements 1 are arranged on the upper surface of the conductive pattern334, the plurality of the semiconductor elements 1 may be composed ofthe same semiconductor elements or different semiconductor elements.

The heat dissipation plate 31 has a function of dissipating a lot ofheat toward the outside, the heat being generated while thesemiconductor element 1 is operating. Heat dissipation takes place bothby heat transfer to the air due to convection and radiation and by heatconduction in which heat is transferred through objects in contact witheach other. Therefore, the heat generated from the semiconductor element1 can be effectively dissipated outside via the heat dissipation plate31 by forming the heat dissipation plate 31 with a material excellent inthermal conductivity and by cooling a heat sink (not illustrated)arranged on a surface of the heat dissipation plate 31, the surfacebeing opposite to the semiconductor element 1, with air cooling, watercooling, or the like.

In the first embodiment, the heat dissipation plate 31 made of Cu isused, but the material of the heat dissipation plate 31 is not limitedto this. The heat dissipation plate 31 may be made, for example, of ametal material such as iron (Fe), tungsten (W), molybdenum (Mo), nickel(Ni), or cobalt (Co), or of an alloy material containing these metalmaterials. Alternatively, the heat dissipation plate 31 may be made of acomposite material in which these metal materials or alloy materials arecombined.

An alloy (Cu—W) of copper and tungsten is a composite material thatcombines the low thermal expansion of tungsten and the high thermalconductivity of copper. The thermal expansion coefficient can beadjusted in accordance with a surrounding material by changing thecomposition ratio of tungsten to copper. An alloy (Cu—Mo) of copper andmolybdenum can be expected to have a higher thermal conductivity thanCu—W, and is a material whose thermal expansion coefficient and thermalconductivity can be similarly adjusted by changing the composition ratioof molybdenum to copper. Also, a clad material having a three-layerstructure, obtained by using Cu—Mo as a core material and by bonding Cuto both the sides; and the like can be mentioned. Since the surface ofthis clad material is pure copper, surface heat dispersion can beincreased.

The insulating layer 32 is a glass epoxy substrate such as FR (FlameRetardant)-4 or FR-5. The insulating layer 32 may be an aluminasubstrate. The material of the conductive layer 33 is not particularlylimited as far as it has conductivity. The conductive layer 33 may beformed of a material mainly containing Cu, Al, and the like.Alternatively, the conductive layer 33 may be formed by plating aconductive material, such as Au or Ag, on the insulating layer 32.

In the first embodiment, the wiring member bonding portions 331 b areisolated from each other in the plurality of the conductive patterns331, as illustrated in FIG. 2, but the wiring member bonding portions331 b may be united without being isolated. In this case, when a wire asthe wiring member 41 is wire bonded, it is sufficient to set thedistance and height between the upper electrode 9 of the semiconductorelement 1 and the wiring member bonding portion 331 b, and henceaccurate alignment for each wiring member bonding portion 331 b becomesunnecessary. Therefore, the time necessary for the wire bonding can beshortened.

When the wiring member bonding portion 331 b is isolated for each wiringmember 41, as illustrated in FIG. 2, the area where the insulating layer32 and the second sealing material 72 closely adhere to each other isincreased, and hence reliability is improved. Thus, the shape of thewiring member bonding portion 331 b may be determined in considerationof trade-off between takt time in manufacturing and reliability. Also,the shapes of the wiring member bonding portions 332 a of the pluralityof the conductive patterns 332 are determined in consideration oftrade-off between takt time in manufacturing and reliability.

The number of the conductive patterns 334 may be one or more like thesemiconductor element 1, and in the first embodiment, the case where oneconductive pattern 334 is provided is described. Although not describedin the first embodiment, a solder resist may be formed on the insulatinglayer 32 in order to control the range of the wet spreading of a bondingmaterial 51 for bonding the electronic component 5.

The base substrate 3 is composed of the heat dissipation plate 31, theinsulating layer 32, and the conductive layer 33. The heat dissipationplate 31 is bonded to the insulating layer 32 via a fiber reinforcedresin material like an epoxy resin reinforced by a glass cloth. It isdesirable that the softening temperature of the fiber reinforced resinmaterial is higher than the melting point of the bonding material 51.

The electronic component 5 is, for example, a chip resistor. The chipresistor is mounted on the conductive layer 33 to adjust the highfrequency characteristics of the semiconductor element 1. In the firstembodiment 1, a chip resistor is mounted as the electronic component 5,but the electronic component 5 may be, for example, a chip capacitor orthe like. One or more electronic components 5 are required, which ismounted on the conductive layer 33. When a plurality of the electroniccomponents 5 are mounted, they may be the same as or different from eachother. The electronic component 5 is bonded to the conductive layer 33with the bonding material 51. The bonding material 51 is, for example, asolder paste. The solder paste is not limited to a Pb-based solder, andmay be a Pb-free solder like SAC 305.

The semiconductor element 1 is bonded to the conductive pattern 334 ofthe conductive layer 33 via the bonding material 2. In the firstembodiment, the bonding materials 2 is a solder alloy such as Au—Sn,Au—Ge, or Au—Si. The bonding material 2 is not limited to a solder alloywith a low melting point, and may be a conductive adhesive in whichmetal fillers with high thermal conductivity are dispersed. Theconductive adhesive can be die-bonded at a low temperature lower than orequal to 200° C., which can reduce occurrence of thermal stress to beapplied to the surrounding members and a warp, both possibly beingcaused during the die-bonding. Ag fillers are generally used as themetal fillers to be dispersed in the conductive adhesive, but metalsother than Ag may be adopted and Cu fillers, Ni fillers, Au fillers, Pdfillers, carbon fillers, or the like can offer the same effects as Agfillers.

In addition, as the bonding material 2, a sinterable metal paste may beused, in which micro-sized metal particles, nano-sized metal particles,or micro-sized and nano-sized metal particles are mixed in a solvent.The sinterable metal paste can be die-bonded at about 200° C. like theconductive adhesive. Further, in a sinterable metal paste aftersintering, metal particles are sinter-bonded together to produce a stateclose to a metal-bulk state, and hence very high heat resistance can beobtained. As a result, the reliability during high temperature operationat 175° C. or higher can be improved. As the sinterable metal paste, anAg paste using Ag particles is generally used, but particles other thanAg may be used and a paste, in which Cu particles, Ni particles, Auparticles, or the like are mixed in a solvent, can offer the sameeffects.

The epoxy resin to be used as the first sealing material 71 is a hardresin having a relatively high Young's modulus. Therefore, thereliability of the semiconductor device against thermal stress can beimproved by covering and holding the semiconductor element 1 and thebonding material 2. The flexural modulus of the epoxy resin is withinthe range of 100 MPa to 20000 MPa (inclusive), the glass transitiontemperature Tg is within the range of 140° C. to 210° C. (inclusive),and the thermal expansion coefficient al is within the range of10×10⁻⁶/K to 50×10⁻⁶/K (inclusive) at a temperature lower than or equalto Tg. The flexural modulus of the first sealing material 71 is morepreferably about 150 MPa, the glass transition temperature Tg is morepreferably within the range of 175° C. to 210° C. (inclusive), and thethermal expansion coefficient al is more preferably within the range of10×10⁻⁶/K to 20×10⁻⁶/K (inclusive) at a temperature lower than or equalto Tg. When the glass transition temperature is 175° C. or higher, itcan be avoided that the linear expansion coefficient may be rapidlyincreased by 2 to 4 times even at the maximum temperature during theoperation of the semiconductor device, whereby the reliability duringhigh temperature operation can be ensured. The first sealing material 71is not limited to an epoxy resin, and a material having any molecularstructure may be adopted as far as the above physical properties aresatisfied.

Since the silicone gel to be used also as the second sealing material 72is a relatively soft resin, deformation due to thermal stress can beabsorbed. Therefore, it plays the role of protecting the wiring member 4from dust without putting a heavy load on the wiring member 4. Thesilicone gel is not particularly limited, but it is desirable that: thesilicone gel is a one-liquid type that is easy to use; it sufficientlyadheres to metals, ceramics, glass, and the like; the curing temperatureis 200° C. or lower; the flexural modulus is within the range of 1 MPato 5 MPa (inclusive); the viscosity is within the range of 10 Pa·s to 20Pa·s (inclusive); and the penetration depth after curing is within therange of 30 to 100 (inclusive) (penetration depth is measured accordingto JIS K 6249). The second sealing material 72 is not limited tosilicone gel, and a material having any molecular structure may beadopted as far as the above physical properties are satisfied. The aboveflexural moduli of the first and second sealing materials 71 and 72 arevalues based on the specification of JIS K 6911 (General Test Method forThermosetting Plastics).

<Manufacturing Method>

A manufacturing method of the semiconductor device according to thefirst embodiment will be described. First, the base substrate 3 isprovided. Next, the electronic component 5 is bonded to the conductivelayer 33 by a reflow process. That is, the bonding material 51, i.e.,the solder paste is arranged on the conductive patterns 332 and 333 ofthe conductive layer 33 of the base substrate 3, and the bondingmaterial 51 is heated to be melted in a state where the electroniccomponent 5 is mounted on the bonding material 51.

Next, the semiconductor element 1 is bonded to the conductive pattern334 with the bonding material 2. The bonding material 2 is a conductiveadhesive in which silver (Ag) fillers are dispersed in an epoxy resin.The bonding is performed by heating at 150° C. for 2 hours in a statewhere the semiconductor element 1 is arranged above the conductivepattern 334 via the bonding material 2.

Next, the input side upper electrode 91 of the semiconductor element 1and the conductive pattern 331 are bonded together with a wire, i.e.,the wiring member 41 by wire bonding. Also, the output side upperelectrode 92 of the semiconductor element 1 and the conductive pattern332 are bonded together with a wire, i.e., the wiring member 42 by wirebonding.

Next, an epoxy resin is supplied with a dispenser as the first sealingmaterial 71 for the semiconductor element 1. The epoxy resin is cured byheating at 130° C. for 1.5 hours. As a result, the semiconductor element1 is sealed with the first sealing material 71.

Next, silicone gel is applied, from the outside of the first sealingmaterial 71, to the periphery of the semiconductor element as the secondsealing material 72. The silicone gel is cured by heating at 130° C. for30 minutes. As a result, the semiconductor element 1 is sealed from theoutside of the first sealing material 71 with the second sealingmaterial 72. Also, the wiring member 4 is sealed with the second sealingmaterial 72.

Finally, the cap 6 is adhered to the conductive layer 33 with theadhesive 61 so as to cover the semiconductor element 1, the wiringmember 4, the electronic component 5, and the like. The adhesive 61 is,for example, a silicone adhesive and is cured by heating at 120° C. for1 hour.

<Effects>

The semiconductor device according to the first embodiment includes theinsulating layer 32, the conductive layer 33 bonded to one main surfaceof the insulating layer 32, and the semiconductor element 1 arrangedsuch that the upper surface of the semiconductor element 1 faces adirection same as the one main surface of the insulating layer 32, andthe semiconductor device further includes the upper electrode 9 providedon the upper surface of the semiconductor element 1, the wiring member 4that has one end electrically bonded to the upper electrode 9 of thesemiconductor element 1 and has another end electrically bonded to theconductive layer 33, and has the hollow portion 4 a, the first sealingmaterial 71, and the second sealing material 72 softer than the firstsealing material 71, in which the first sealing material 71 seals atleast part of the semiconductor element 1 so as to be in contact withthe semiconductor element 1, and the second sealing material 72 sealsthe wiring member 4 so as to be in contact with the wiring member 4.

In the semiconductor device according to the first embodiment, thesemiconductor element 1 is sealed with the relatively hard first sealingmaterial 71, and hence peeling of the semiconductor element 1 can besuppressed. Further, the wiring member 4 is sealed with the relativelysoft second sealing material 72, and hence the wiring member 4 can beprotected from dust and stress to the wiring member 4 can be reducedeven if stress is applied to the circumference of the wiring member 4due to a warp caused in the insulating layer 32 and the conductive layer33, or the like. Therefore, the reliability of the semiconductor devicecan be improved.

Furthermore, in the semiconductor device according to the firstembodiment, the first sealing material 71 seals the semiconductorelement 1 so as to be in contact with the semiconductor element 1, andhence the semiconductor element 1 can be uniformly sealed. Similarly,the wiring member 4 can be uniformly sealed by the second sealingmaterial 72 sealing the wiring member 4 so as to be in contact with thewiring member 4. Therefore, the reliability of the semiconductor devicecan be further improved.

In the semiconductor device according to the first embodiment, an areaof the wiring member 4 where the wiring member 4 is in contact with thesecond sealing material 72 is larger than an area of the wiring member 4where the wiring member 4 is in contact with the first sealing material71. That is, in the first embodiment, the periphery of a portion of thewiring member 4, in the portion the wiring member 4 being bonded to theupper electrode 9 of the semiconductor element 1, is sealed with thefirst sealing material 71, but most part of the wiring members 4 issealed with the second sealing material 72, as illustrated in FIG. 1.Since most part of the wiring member 4 is sealed with the relativelysoft second sealing material 72, thermal stress to the wiring member 4can be reduced.

In the semiconductor device according to the first embodiment, thewiring member 4 is a wire Wires are generally susceptible to damage fromexternal forces, such as disconnection. In the first embodiment, thermalstress to the wiring member 4 can be reduced by sealing the wire withthe relatively soft second sealing material 72, even if a warp is causedin the base substrate 3.

In the semiconductor device according to the first embodiment, theflexural modulus of the second sealing material 72 is smaller than thatof the first sealing material 71. For example, the flexural modulus ofthe second sealing material 72 is set to be within the range of 1 MPa to5 MPa (inclusive), and that of the first sealing material 71 is set toabout 150 MPa, in the first embodiment. The semiconductor element 1 canbe firmly held to the conductive pattern 334 via the bonding material 2by sealing the semiconductor element 1 with the first sealing material71 that has a relatively large flexural modulus, i.e., that isrelatively hard. Further, thermal stress to the wiring member 4 can bereduced by sealing the wiring member 4 with the second sealing material72 that has a relatively small flexural modulus, i.e., that isrelatively soft.

Second Embodiment

FIG. 3 is a cross sectional view of a semiconductor device according toa second embodiment. FIG. 4 is a plan view of the semiconductor deviceaccording to the second embodiment. The cross section of thesemiconductor device illustrated in FIG. 3 is taken along line B-B ofFIG. 4. In FIG. 4, a second sealing material 72 and a cap 6 areillustrated by virtual lines for easy understanding of the drawing.

In the second embodiment, an opening 8 is provided in almost the centerof a base substrate 3. Since the length of a wiring member 4, one of thefactors that reduce high frequency characteristics, can be shortened byproviding the opening 8, a structure suitable for a high frequencysemiconductor device can be achieved.

A heat dissipation plate 31 is not covered with an insulating layer 32in the opening 8. The opening 8 is formed by cutting the insulatinglayer 32, for example, by machining. In the second embodiment, theopening 8 is provided in the base substrate 3, and hence a conductivelayer 33 has a configuration in which the conductive pattern 334described in the first embodiment is not included. In the secondembodiment, the lower surface of a semiconductor element 1 is bonded toa heat dissipation plate 31 via a bonding material 2 in the opening 8 ofthe base substrate 3.

The opening 8 of the base substrate 3 and the semiconductor element 1are sealed with a first sealing material 71. The first sealing material71 is, for example, an epoxy resin. The first sealing material 71 hasthe physical characteristics described in the first embodiment.

The periphery of the opening 8 is sealed with a second sealing material72. The second sealing material 72 is softer than the first sealingmaterial 71. The second sealing material 72 is, for example, siliconegel. The second sealing material 72 seals the wiring member 4. Thesecond sealing material 72 also seals the semiconductor element 1 fromthe outside of the first sealing material 71. The second sealingmaterial 72 has the physical characteristics described in the firstembodiment.

The semiconductor element 1 is arranged in the opening 8 of the basesubstrate 3. In the second embodiment, one semiconductor element 1 isarranged in the opening 8, but a plurality of the semiconductor elements1 may be arranged in the opening 8. When a plurality of thesemiconductor elements 1 are arranged in the opening 8, the plurality ofthe semiconductor elements 1 may be composed of the same semiconductorelements or different semiconductor elements.

The insulating layer 32 has the opening 8 having a depth reaching up tothe heat dissipation plate 31, so that when the base substrate 3 aloneis viewed in plan, the heat dissipation plate 31 is exposed outside. Thenumber of the openings 8 may be one or more like the semiconductorelement 1, and in the second embodiment, the case where one opening 8 isprovided is described.

Since other configurations of the semiconductor device of the secondembodiment are the same as the semiconductor device of the firstembodiment, description thereof will be omitted.

<Manufacturing Method>

FIGS. 5 to 9 are views each illustrating a manufacturing step of thesemiconductor device according to the second embodiment. First, the basesubstrate 3 is provided. Next, an electronic component 5 is bonded tothe conductive layer 33 by a reflow process, as illustrated in FIG. 5.That is, the bonding material 51, i.e., the solder paste is arranged onthe conductive patterns 332 and 333 of the conductive layer 33 of thebase substrate 3, and the bonding material 51 is heated to be melted ina state where the electronic component 5 is mounted on the bondingmaterial 51.

Next, the semiconductor element 1 is bonded to the heat dissipationplate 31 with the bonding material 2, as illustrated in FIG. 6. Thebonding material 2 is a conductive adhesive in which silver (Ag) fillersare dispersed in an epoxy resin. The bonding is performed by heating at150° C. for 2 hours in a state where the semiconductor element 1 isarranged above the heat dissipation plate 31 via the bonding material 2.

Next, an input side upper electrode 91 of the semiconductor element 1and a conductive pattern 331 are bonded together with a wire, i.e., awiring member 41 by wire bonding, as illustrated in FIG. 7. Also, theoutput side upper electrode 92 of the semiconductor element 1 and theconductive pattern 332 are bonded together with a wire, i.e., the wiringmember 42 by wire bonding.

Next, an epoxy resin is supplied with a dispenser as the first sealingmaterial 71 for the opening 8, as illustrated in FIG. 8. The epoxy resinis cured by heating at 130° C. for 1.5 hours. As a result, the opening 8and the semiconductor element 1 is sealed with the first sealingmaterial 71.

Next, the silicone gel is applied, from the outside of the first sealingmaterial 71, to the periphery of the semiconductor element as the secondsealing material 72, as illustrated in FIG. 9. The silicone gel is curedby heating at 130° C. for 30 minutes. As a result, the semiconductorelement 1 is sealed from the outside of the first sealing material 71with the second sealing material 72. Also, the wiring member 4 is sealedwith the second sealing material 72.

Finally, the cap 6 is adhered to the conductive layer 33 with theadhesive 61 so as to cover the semiconductor element 1, the wiringmember 4, the electronic component 5, and the like. The adhesive 61 iscured by heating at 120° C. for 1 hour. The semiconductor deviceillustrated in FIG. 3 is obtained through the above manufacturing steps.

<Effects>

The semiconductor device according to the second embodiment furtherincludes the heat dissipation plate 31, in which: another main surfaceof the insulating layer 32 is bonded to one main surface of the heatdissipation plate 31; the opening 8, where the heat dissipation plate 31is not covered with the insulating layer 32, is provided on the one mainsurface of the heat dissipation plate 31; the lower surface of thesemiconductor element 1 is bonded to the one main surface of the heatdissipation plate 31 in the opening 8; and the first sealing material 71seals at least part of the semiconductor element 1 and the opening 8.

In the semiconductor device according to the second embodiment, astructure is adopted, in which the semiconductor element 1 is bondeddirectly onto the heat dissipation plate 31. Therefore, in a die-bondingstep of the manufacturing steps or temperature cycles in reliabilityevaluation, large thermal stress is generated in a die-bonding portion(i.e., the bonding material 2 that bonds the semiconductor element 1 andthe heat dissipation plate 31) due to a mismatch between the thermalexpansion coefficients of the semiconductor element 1 and the heatdissipation plate 31. As a result, there is the possibility that a crackor the like may occur in the die-bonding portion so that heatdissipation deteriorates.

If the area ranging from the inside of the opening 8 to the wiringmember 4 is sealed, for example, only with silicone gel, the force bywhich the semiconductor element 1 and a bonding material 2 are held issmall since the silicone gel is relatively soft, and the deteriorationof the bonding material 2 cannot be suppressed.

Alternatively, if the area ranging from the inside of the opening 8 tothe wiring member 4 is sealed, for example, only with an epoxy resin,the thermal expansion coefficient of the epoxy resin, adjusted to thethermal expansion coefficient of Cu that forms the heat dissipationplate 31, is within the range of 15 ppm/K to 20 ppm/K (inclusive). Onthe other hand, the thermal expansion coefficient in the thicknessdirection of glass epoxy that forms the insulating layer 32 is about 60ppm/K, and hence peeling is likely to occur at the interface between theepoxy resin and the glass epoxy during temperature cycles. Since thepeeling propagates toward the outside of the peeled portion, the outsidehaving large thermal stress, there is high possibility that the wiringmember 4 bonded to the surface of the conductive layer 33 may bedamaged.

Further, the epoxy resin is also peeled between the epoxy resin and theconductive layer 33 in a reliability test such as a thermal shock testor an intermittent current test, and hence it has been confirmed that itis difficult to extend the life of the semiconductor device. Since theadhesion of a common epoxy resin to the conductive layer 33 formed of Auor the like is not so good, it is considered that the peeling hasoccurred by the thermal stress continuously applied in the abovereliability test. In addition, an epoxy resin has a high Young's modulusand the adhesion to the wiring member 4 is relatively good, and hencewhen the epoxy resin is peeled off the conductive layer 33, it lifts thewiring member 4 together. This is the same even in a structure in whichthe opening 8 is not provided like the first embodiment, and if thewiring member 4 is covered with an epoxy resin such that the end of thewiring member 4 is the starting point or end point, the peeling of theepoxy resin occurs with the conductive layer 33 located directly belowit as the starting point.

In the second embodiment, the inside of the opening 8 of a basesubstrate 3 is sealed with the relatively hard first sealing material71, and the wiring member 4 outside the opening 8 is sealed with therelatively soft second sealing material 72, as illustrated in FIG. 3.The bonding material 2, which is susceptible to the influence of thethermal stress occurring due to the difference between the thermalexpansion coefficients of the semiconductor element 1 and the heatdissipation plate 31, is reinforced by the relatively hard first sealingmaterial 71. Further, by sealing the wiring member 4 with the relativelysoft second sealing material 72, the wiring member 4 can be protectedfrom dust and thermal stress to the wiring member 4 can be reduced evenif a warp is caused in the base substrate 3. Therefore, the reliabilityof the semiconductor device can be improved.

In the opening 8 in the semiconductor device according to the secondembodiment, one main surface of the insulating layer 32, i.e., the uppersurface of the insulating layer 32 is arranged to be higher than theupper surface of the semiconductor element 1. By arranging the uppersurface of the insulating layer 32 so as to be higher than the uppersurface of the semiconductor element 1, the semiconductor element 1 canbe sealed just enough with the first sealing material 71 without thefirst sealing material 71 greatly swelling from the opening 8.

In the semiconductor device according to the second embodiment, theinsulating layer 32 is glass epoxy and the first sealing material 71 isan epoxy resin. Since an epoxy resin has high adhesion to glass epoxy,the first sealing material 71 satisfactorily adheres to a side surface32 a of the insulating layer 32 in the opening 8. As a result, peelingof the first sealing material 71 from the heat dissipation plate 31,which may be caused due to the thermal stress or a warp that may becaused: in a die-bonding step of the manufacturing steps; in temperaturecycles in reliability evaluation; or the like, can be suppressed.

In the semiconductor device according to the second embodiment, thefirst sealing material 71 is an epoxy resin and the second sealingmaterial 72 is silicone gel. Since the thermal conductivity of an epoxyresin is generally higher than that of silicone gel, the heatdissipation of the semiconductor device is improved by sealing thesemiconductor element 1 with an epoxy resin.

In the semiconductor device according to the second embodiment, thebonding material 2 that bonds the semiconductor element 1 and the heatdissipation plate 31 is a conductive resin, and the conductive resincontains one of an epoxy resin, an acrylic resin, and silicone rubber,and metal fillers. As the bonding material 2 that bonds thesemiconductor element 1 and the heat dissipation plate 31, a conductiveadhesive containing metal fillers such as Ag, Au, or Cu may be used.When the conductive adhesive is used, not only the metal fillers butalso an epoxy resin, a silicone resin, or an acrylic resin exist in thesurface of a fillet portion, and the adhesion of the conductive adhesiveto the first sealing material 71 is more excellent compared to a solderfillet. Therefore, the first sealing material 71 can hold the bondingmaterial 2 more firmly, and the reliability of the semiconductor devicecan be further improved.

In the semiconductor device according to the second embodiment, thebonding material 2 that bonds the semiconductor element 1 and the heatdissipation plate 31 may be a sinterable bonding material. The surfaceof the bonding material 2 may also be porous.

As the bonding material 2 that bonds the semiconductor element 1 and theheat dissipation plate 31, a sinterable metal paste may be used, inwhich micro-sized metal particles, nano-sized metal particles, ormicro-sized and nano-sized metal particles are mixed in a solvent. Thesinterable metal (e.g., Ag, Au, Cu, or the like) paste can be die-bondedat a low temperature lower than or equal to about 200° C. like theconductive adhesive, and in addition metal particles are sinter-bondedtogether after sintering to produce a state close to a metal-bulk state,and hence very high-adhesion, -thermal conductivity, and -heatresistance can be obtained. As a result, the reliability during hightemperature operation at 175° C. or higher can be improved. When themetal sintering material is used, many holes, from which the volatilizedsolvent has been released at the time of sintering, are formed on thesurface of a fillet portion, and hence the fillet portion has a porousstructure. Therefore, the first sealing material 71 injected into theopening 8 of the base substrate 3 penetrates into the holes of thefillet portion, which improves adhesion by an anchor effect. Therefore,the first sealing material 71 can hold the bonding material 2 morefirmly, and the reliability of the semiconductor device can be furtherimproved.

There are two types of the above sinterable metal paste, including onetype that needs pressure during sintering and the other type that doesnot need pressure. In the case of the type that needs pressure, it isnecessary to provide a shock absorber between the chip-shapedsemiconductor element 1 and a pressure unit of a pressure apparatussince pressure cannot be applied directly to the surface of thesemiconductor element 1 by the pressure apparatus. In addition, anyforeign matter attached to the surface of the semiconductor element 1can cause a scratch in the semiconductor element 1, and hence the typethat needs pressure is not so suitable for the bonding material 2 to beused in a high frequency semiconductor element with a delicate surface.On the other hand, in the case of a sinterable metal paste, the othertype that does not need pressure, the tackiness of the paste is lostwhen temporarily sintered and its bonding strength, which is smallcompared to that of the pressure type, becomes still smaller, and henceit is desirable to complete sintering by one-time heating.

Third Embodiment

FIG. 10 is a cross sectional view of a semiconductor device according toa third embodiment. FIG. 11 is a plan view of the semiconductor deviceaccording to the third embodiment. The cross section of thesemiconductor device illustrated in FIG. 10 is taken along line C-C ofFIG. 11. In FIG. 11, a second sealing material 72 and a cap 6 areillustrated by virtual lines for easy understanding of the drawing.

In the third embodiment, an opening 8 of a base substrate 3 is alsosealed with a first sealing material 71 like the second embodiment. Inthe third embodiment, the opening 8 is further filled with the firstsealing material 71 to a height higher than or equal to the height ofone main surface (i.e., the upper surface) of an insulating layer 32, asillustrated in FIG. 10. The first sealing material 71 is arranged suchthat it may be in contact with the side surface of a conductive layer 33but it is not in contact with the upper surface of the conductive layer33.

FIG. 12 is a cross sectional view illustrating a variation of thesemiconductor device according to the third embodiment. As illustratedin FIG. 12, a second sealing material 72 may be arranged in a dividedshape. In this case, the second sealing material 72 is applied in twosteps in a manufacturing step. Since the second sealing material 72 isapplied in two steps, an application amount per step can be reduced,which makes it easy to adjust an application amount for sealing thewiring member 4 just enough.

Since other configurations of the semiconductor devices of the thirdembodiment and the variation of the third embodiment are the same as thesemiconductor device of the second embodiment, description thereof willbe omitted.

<Effects>

In the semiconductor device according to the third embodiment, theopening 8 is filled with the first sealing material 71 to a heighthigher than or equal to the height of the one main surface of theinsulating layer 32. Thereby, the contact area between the first sealingmaterial 71 and a side surface 32 a of the insulating layer 32 isincreased, and hence the adhesion between the first sealing material 71and a heat dissipation plate 31 is increased and the reliability of thesemiconductor device can be further improved. In particular, when theinsulating layer 32 is glass epoxy and the first sealing material 71 isan epoxy resin, an epoxy resin has high adhesion to glass epoxy, andhence the first sealing material 71 satisfactorily adheres to the sidesurface 32 a of the insulating layer 32 in the opening 8. Therefore, theadhesion between the first sealing material 71 and the heat dissipationplate 31 is further improved, and the reliability of the semiconductordevice can be further improved.

In order to confirm effects of improving the adhesion in the thirdembodiment 3, a resin adhesion strength test (i.e., a pudding-cup test)was carried out. In the resin adhesion strength test, a first sample wasmade, in which a stainless steel cup (diameter: 6 mm, height: 4 mm) wasmounted on a copper plate whose surface was plated with Ni or Au andthen an epoxy resin was applied. Then, a second sample was made, inwhich a stainless steel cup was mounted on a glass epoxy plate and anepoxy resin was applied. The epoxy resin of each sample was cured underthe recommended conditions. As a result of carrying out a shear test forthe first sample in each of a room temperature atmosphere and 150° C.atmosphere, shear strength was 20 kg and 10 kg. As a result of carryingout a shear test for the second sample in each of a room temperatureatmosphere and 150° C. atmosphere, shear strength was 42 kg and 38 kg.From the above results, it was found that the adhesion of the epoxyresin to the glass epoxy plate was two times or more than the adhesionto the copper plate. It was also found that high adhesion was maintainedeven in a high temperature atmosphere as high as 150° C. From the abovetests, it was confirmed that the reliability of the semiconductor devicecan be improved by increasing the contact area between the epoxy resinas the first sealing material 71 and the glass epoxy as the insulatinglayer 32.

Fourth Embodiment

FIG. 13 is a cross sectional view of a semiconductor device according toa fourth embodiment. FIG. 14 is a plan view of the semiconductor deviceaccording to the fourth embodiment. The cross section of thesemiconductor device illustrated in FIG. 13 is taken along line D-D ofFIG. 14. In FIG. 14, a second sealing material 72 and a cap 6 areillustrated by virtual lines for easy understanding of the drawing.

In the fourth embodiment, an opening 8 of a base substrate 3 is alsosealed with a first sealing material 71 like the second embodiment. Inthe fourth embodiment, the first sealing material 71 seals part of asemiconductor element 1 so as not to be in contact with a wiring member4. A second sealing material 72 seals the whole of the wiring member 4.

That is, the first sealing material 71 is arranged such that it may bein contact with the side surface of the semiconductor element 1 but maynot be in contact with the upper surface of the semiconductor element 1.However, unless the first sealing material 71 is not in contact with ahollow portion 4 a of the wiring member 4, the first sealing material 71may cover the upper surface of the semiconductor element 1. The secondsealing material 72 may be in contact with at least the whole of thehollow portion 4 a of the wiring member 4.

In semiconductor devices handling high frequency signals, a coplanarline type MMIC (Monolithic Microwave Integrated Circuit) is known as oneof the common configurations of MMICs in which an active element and apassive element can be collectively formed on a semiconductor substrate.In the coplanar line type MIMIC, a fine air bridge of about several μmmay be arranged on the surface of the semiconductor element 1. Asillustrated in FIG. 19 described later, the semiconductor element 1 isprovided with an air bridge existing area 100 between upper electrodes91 and 92. The air bridge is provided above the air bridge existing area100. The case is considered, in which the air bridge, which is onewiring structure, is covered with a hard resin like an epoxy resin. Inthis case, there is the possibility that the fine air bridge may becrushed by the hardness of the cured epoxy resin or by the stress of theepoxy resin occurring during cure shrinkage.

Therefore, it is preferable that the first sealing material 71 sealspart of the semiconductor element 1 so as not to be in contact with theair bridge and the upper surface of the semiconductor element 1 withoutcovering the entire surface of the semiconductor element 1, asillustrated in FIG. 14.

Since other configurations of the semiconductor device of the fourthembodiment are the same as the semiconductor device of the secondembodiment, description thereof will be omitted.

<Effects>

In the semiconductor device according to the fourth embodiment, thefirst sealing material 71 seals at least part of the semiconductorelement 1 so as not to be in contact with the hollow portion 4 a of thewiring member 4, and the second sealing material 72 is in contact withthe whole of the hollow portion 4 a of the wiring member 4.

At the interface where a hard sealing material and a soft sealingmaterial are in contact with each other, there is the possibility thatthe stress, occurring due to the differences between the Young's moduliof the two sealing materials and between the thermal expansions thereof,may concentrate during a temperature cycle test and a power cycle test.Also, the amount of moisture absorbed from the outside is increased atthe interface, even though the hard sealing material and the softsealing material adhere together. There is the possibility that a wiremay deteriorate due to a lot of moisture absorption, so that wiredisconnection is accelerated. In the fourth embodiment, the secondsealing material 72 is in contact with the hollow portion 4 a of thewiring member. That is, the interface between the first sealing material71 and the second sealing material 72 is not in contact with the hollowportion 4 a of the wiring member 4, and hence disconnection of thewiring member 4, which may be caused by stress, can be suppressed.Further, deterioration of the wiring member 4, which may be caused bymoisture, can be suppressed. Furthermore, the whole of the hollowportion 4 a of the wiring member 4 is sealed with the soft secondsealing material 72, and hence the influence of stress given to thewiring member 4 can be reduced, and the reliability of the semiconductordevice can be further improved.

Fifth Embodiment

FIG. 15 is a plan view of a semiconductor device according to a fifthembodiment. In FIG. 15, a second sealing material 72 and a cap 6 areillustrated by virtual lines for easy understanding of the drawing. Inthe second embodiment, the whole of the opening 8 of the base substrate3 is sealed with the first sealing material 71.

On the other hand, in the fifth embodiment, a semiconductor element 1has a rectangular shape in plan view, and the four corners and the shortsides facing each other of the semiconductor element 1 are sealed with afirst sealing material 71, as illustrated in FIG. 15. The first sealingmaterial 71 is also in contact with a side surface 32 a of an insulatinglayer 32 near to the short side of the semiconductor element 1, and thefirst sealing material 71 has sufficient adhesion strength. Also, in thefifth embodiment, it is desirable to arrange the first sealing material71 so as not to be in contact with a hollow portion 4 a of a wiringmember 4 like the fourth embodiment.

As illustrated in FIG. 15, a portion of the opening 8 that is not sealedwith the sealing material 71 is sealed with the second sealing material72. Also, the wiring member 4 is sealed with the second sealing material72. Since other configurations of the semiconductor device of the fifthembodiment are the same as the semiconductor device of the secondembodiment, description thereof will be omitted.

<Effects>

In the fifth embodiment, the semiconductor element 1 has a rectangularshape in plan view, and the first sealing material 71 seals the fourcorners of the semiconductor element 1, and the first sealing material71 extends, of two pairs of the sides facing each other in plan view,along any one of the pairs of the sides facing each other.

Therefore, by the first sealing material 71 sealing both the fourcorners of the semiconductor element 1 and, of two pairs of the sidesfacing each other, any one of the pairs of the sides facing each other,the semiconductor element 1 can be firmly adhered and fixed to a heatdissipation plate 31 with a smaller amount of the sealing materialcompared to the case where the whole of the semiconductor element 1 issealed with the first sealing material 71.

Air is generally likely to be involved when a resin such as an epoxyresin is poured into a recess of a substrate in a manufacturing step.Therefore, there is the possibility that a void, i.e., a bubble may beformed in a sealed portion after the epoxy resin is cured. As measuresagainst this, for example, the viscosity of the resin is lowered bywarming the substrate in advance, which can suppress the involvement ofair. Alternatively, a vacuuming mechanism is added, which can remove avoid before curing. However, additional capital investment throughequipment remodeling and addition of a manufacturing step are needed inany measure. Then, the first sealing material 71 is arranged only in theminimum required places in the opening 8, as in the fifth embodiment,which can greatly reduce the amount of the first sealing material 71 tobe used for sealing. By reducing the amount of the first sealingmaterial 71 to be arranged, the possibility that a void may be formed inthe first sealing material 71 can be reduced without additional capitalinvestment and addition of a manufacturing step.

In the semiconductor device according to the fifth embodiment, the firstsealing material 71 extends, of two pairs of the sides facing each otherin plan view of the semiconductor element 1, along a pair of the shortersides facing each other. When the first sealing material 71 is arrangedalong the short sides facing each other, as illustrated in FIG. 15, theamount of the first sealing material 71 arranged is smaller compared towhen the first sealing material 71 is arranged along the long sidesfacing each other. Therefore, the possibility that a void may be causedin the first sealing material 71 can be further reduced. Further, thefour corners of the semiconductor element 1, where stress is generated,are covered with the first sealing material 71, and hence thereliability of the semiconductor device is sufficiently ensured.

Sixth Embodiment

FIG. 16 is a plan view of a semiconductor device according to a sixthembodiment. In FIG. 16, a second sealing material 72 and a cap 6 areillustrated by virtual lines for easy understanding of the drawing. Inthe fifth embodiment, the four corners and the short sides facing eachother of the semiconductor element 1 are sealed with the first sealingmaterial 71. On the other hand, in the sixth embodiment, the fourcorners and the long sides facing each other of a semiconductor element1 are sealed with a first sealing material 71. Since otherconfigurations of the semiconductor device of the sixth embodiment arethe same as the semiconductor device of the fifth embodiment,description thereof will be omitted.

<Effects>

In the semiconductor device according to the sixth embodiment, the firstsealing material 71 extends, of two pairs of the sides facing each otherin plan view of the semiconductor element 1, along a pair of the longersides facing each other. In the sixth embodiment, the long sides facingeach other are sealed with the first sealing material 71 instead of theshort sides facing each other, and hence the semiconductor element 1 anda bonding material 2 can be held more firmly with a small amount of thefirst sealing material 71. Therefore, a reduction in the possibilitythat a void may be generated in the first sealing material 71 and highreliability of the semiconductor device can be both achieved.

Seventh Embodiment

FIG. 17 is a plan view of a semiconductor device according to theseventh embodiment. FIG. 18 is a cross sectional view of thesemiconductor device according to the seventh embodiment. The crosssection of the semiconductor device illustrated in FIG. 18 is takenalong line E-E of FIG. 17. In FIG. 17, a second sealing material 72 anda cap 6 are illustrated by virtual lines for easy understanding of thedrawing. FIG. 19 is a plan view schematically illustrating an air bridgeexisting area 100. In FIG. 19, a first sealing material 71 is notillustrated.

In the fifth embodiment, the four corners and the short sides facingeach other of the semiconductor element 1 are sealed with the firstsealing material 71, and in the sixth embodiment, the four corners andthe long sides facing each other of the semiconductor element 1 aresealed with the first sealing material 71. On the other hand, in theseventh embodiment, the four corners of a semiconductor element 1 areonly sealed with the first sealing material 71.

That is, in the semiconductor device of the seventh embodiment, thesemiconductor element 1 has a rectangular shape in plan view, the firstsealing material 71 seals the four corners of the semiconductor element1, the first sealing material 71 is discrete in each of the four cornersof the semiconductor element 1, and the first sealing material 71 ispresent in the four places.

The first sealing material 71 seals each of the four corners of thesemiconductor element 1 such that each corner is not exposed. Also, thefirst sealing material 71 only seals the four corners of thesemiconductor element 1, the four corners being the minimum requiredplaces, and hence it is necessary that the first sealing material 71 issurely in contact with the semiconductor element 1, a bonding material2, and a heat dissipation plate 31 in an opening 8.

On the other hand, it is preferable that the first sealing material 71seals such that it is not in contact with the air bridge existing area100 illustrated in FIG. 19, in order to prevent the deterioration ofhigh frequency characteristics as much as possible. Since the firstsealing material 71 in the seventh embodiment is formed to be discretein each of the four corners, it is not in contact with the air bridgeexisting area 100 between upper electrodes 91 and 92 and thesemiconductor element 1 can be sealed with the first sealing material71.

The semiconductor element 1 to be used in a high frequency semiconductordevice often has a rectangular shape, and hence the semiconductorelement 1 is more likely to tilt along the longitudinal direction of thesemiconductor element 1 after being die-bonded to form the bondingmaterial 2, compared to a square shape.

FIG. 20 is a plan view of a semiconductor device according to avariation of the seventh embodiment. FIG. 21 is a cross sectional viewof the semiconductor device according to the variation of the seventhembodiment. The cross section of the semiconductor device illustrated inFIG. 21 is taken along line F-F of FIG. 20. In FIG. 20, a second sealingmaterial 72 and a cap 6 are illustrated by virtual lines for easyunderstanding of the drawing. In the variation of the seventhembodiment, a structure is adopted, in which it is assumed that asemiconductor element 1 tilts along the longitudinal direction.

As illustrated in FIGS. 20 and 21, a structure is adopted, in which thebonding material 2 is provided such that, of two pairs of sides facingeach other in plan view of the semiconductor element 1, the thickness ofthe bonding material 2, on one side of a pair of the shorter sidesfacing each other, is smaller than the thickness thereof on another sideof the pair. That is, in the variation of the seventh embodiment, it isassumed that a structure is adopted, in which the bonding material 2 isprovided such that, of the short sides facing each other in plan view ofthe semiconductor element 1, the thickness of the bonding material 2, onone side of the short sides, is smaller than the thickness thereof onthe other side of the short sides.

In the seventh embodiment, the first sealing material 71 is formed to beisolated in the four corners of the semiconductor element 1 by adispensing apparatus. That is, the first sealing material 71 is composedof two first sealing materials 711 and 711 and two first sealingmaterials 712 and 712. And, as illustrated in FIG. 21, an applicationamount is changed between the first sealing materials 711 and 712,corresponding to the tilt of the semiconductor element 1.

As illustrated in FIGS. 20 and 21, of the four corners of thesemiconductor element 1, in two corners in each of which the bondingmaterial 2, which is a die-bonding layer, is formed to be relativelythin, a relatively large application amount of the first sealingmaterial 712, is provided, and in two corners in each of which thebonding material 2 is formed to be relatively thick, a relatively smallapplication amount of the first sealing material 711 is provided, theapplication amount being a formation amount.

Thus, the variation of the seventh embodiment has the feature that theapplication amount of the first sealing material 712, in each of the twocorners on one side of the short sides, where the bonding material 2 isformed to be relatively thin, is larger than the application amount ofthe first sealing material 711 in each of the two corners on the otherside of the short sides, where the bonding material 2 is formed to berelatively thick, the application amount being a formation amount. Thatis, in the variation of the seventh embodiment, the first sealingmaterial 71 composed of the two first sealing materials 711 and the twofirst sealing materials 712 is provided such that the formation amountin each of the two corners on one side of the short sides is larger thanthe formation amount in each of the two corners on the other side of theshort sides.

As a result, the thermal stress applied to the bonding material 2between the first sealing materials 711 and 712 can be entirelybalanced. It is also desirable that the height of the first sealingmaterials 711 and 712 is smaller than the formation height of aninsulating layer 32, and the first sealing materials 711 and 712 arecontained in an opening 8. The application amount of each of the firstsealing materials 711 and 712 can be determined before beingmanufactured based on the thickness of the bonding material 2 in eachcorner, after approximate stress to be applied to the bonding material 2is estimated in advance by using simulation or the like and then thestress is accurately predicted by a test using a real device since thestress applied to the bonding material 2 varies depending on thephysical properties and size of each member.

Since other configurations of the semiconductor device of the seventhembodiment are the same as the semiconductor devices of the fifthembodiment and the sixth embodiment, description thereof will beomitted.

<Effects>

The semiconductor element to be used in a high frequency semiconductordevice often has a rectangular shape in plan view, and hence thesemiconductor element 1 is more likely to tilt along the longitudinaldirection of the semiconductor element 1 after being die-bonded to formthe bonding material 2, compared to a square shape. Therefore, thethickness of the bonding material 2, which is a die-bonding layer,varies also in the four corners of the semiconductor element 1, asdescribed above. Generally speaking, stress relaxation is large when thethickness of the bonding material 2 is large, and is small when thethickness of the bonding material 2 is small. Therefore, if thethickness of the bonding material 2 in the four corners of thesemiconductor element 1 varies, the reliability on a thermal shock testin the four corners, or the like also varies, whereby the bondingmaterial 2 may deteriorate from the weakest corner, so that thereliability is limited by the weakest corner.

Then, as illustrated in FIG. 21, by setting different applicationamounts of the first sealing materials 711 and 712 corresponding to thetilt of the semiconductor element 1, i.e., to the thickness of thebonding material 2, the stress relaxation in the four corners can beequalized, the application amounts being formation amounts. Thus, highreliability can be obtained.

In the seventh embodiment, the first sealing material 71 is provided tobe isolated in each of the four corners of the semiconductor element 1.Therefore, when it is assumed that a structure is adopted, in which thebonding material 2 is provided to have a different thickness in each ofthe four corners facing each other in plan view of the semiconductorelement 1, the application amount of the first sealing material 71 ineach of the four corners of the semiconductor element 1 can be set to adifferent amount, corresponding to the thickness of the bonding material2. As a result, in the semiconductor device of the seventh embodiment,the stress relaxation of the bonding material 2 in the four corners canbe equalized even when the bonding material 2 is provided to have adifferent thickness in each of the four corners.

In each of the first embodiment through the seventh embodiment, thefirst sealing material 71 may seal at least part of the semiconductorelement 1 so as to be in directly contact with the semiconductor element1. The second sealing material 72 may seal the wiring member 4 so as tobe in directly contact with the wiring member 4. In the presentinvention, each embodiment can be freely combined or can beappropriately modified or omitted, within the scope of the presentinvention.

Although the present invention has been described in detail, the abovedescription is an exemplification in all aspects, and the presentinvention is not limited thereto. It is understood that countlessvariations not illustrated can be conceived of without departing fromthe scope of the present invention.

1-21. (canceled)
 22. A semiconductor device comprising: an insulatinglayer; a conductive layer bonded to one main surface of the insulatinglayer; a semiconductor element arranged such that an upper surface ofthe semiconductor element faces a direction same as the one main surfaceof the insulating layer, an upper electrode provided on the uppersurface of the semiconductor element; a wiring member that has one endelectrically bonded to the upper electrode of the semiconductor elementand has another end electrically bonded to the conductive layer, and hasa hollow portion; a first sealing material; and a second sealingmaterial, wherein the first sealing material seals at least part of thesemiconductor element so as to be in contact with the semiconductorelement, the second sealing material seals the wiring member so as to bein contact with the wiring member, the first sealing material is anepoxy resin, and the second sealing material is silicone gel, thesemiconductor device further comprising a heat dissipation plate,wherein another main surface of the insulating layer is bonded to onemain surface of the heat dissipation plate, an opening where the heatdissipation plate is not covered with the insulating layer is providedin the one main surface of the heat dissipation plate, a lower surfaceof the semiconductor element is bonded to the one main surface of theheat dissipation plate in the opening, the first sealing material sealsat least part of the semiconductor element and the opening, and thefirst sealing material further seals one end of the wiring member, andthe second sealing material further seals another end of the wiringmember.
 23. The semiconductor device according to claim 22, wherein theopening is filled with the first sealing material to a height higherthan or equal to the one main surface of the insulating layer.
 24. Thesemiconductor device according to claim 23, wherein in the opening, theone main surface of the insulating layer is arranged to be higher thanthe upper surface of the semiconductor element.
 25. The semiconductordevice according to claim 22, wherein an area where the wiring member isin contact with the second sealing material is larger than an area wherethe wiring member is in contact with the first sealing material.
 26. Thesemiconductor device according to claim 22, wherein the wiring member isa wire.
 27. The semiconductor device according to claim 22, wherein aflexural modulus of the second sealing material is smaller than aflexural modulus of the first sealing material.
 28. The semiconductordevice according to claim 22, wherein the insulating layer is glassepoxy.
 29. The semiconductor device according to claim 22, wherein abonding material that bonds the semiconductor element and the heatdissipation plate is a conductive resin, and the conductive resincontains one of an epoxy resin, an acrylic resin, and silicone, and ametal filler.
 30. The semiconductor device according to claim 22,wherein the bonding material that bonds the semiconductor element andthe heat dissipation plate is a sinterable bonding material.
 31. Thesemiconductor device according to claim 22, wherein a surface of thebonding material that bonds the semiconductor element and the heatdissipation plate is porous.
 32. A semiconductor device comprising: aninsulating layer; a conductive layer bonded to one main surface of theinsulating layer; a semiconductor element arranged such that an uppersurface of the semiconductor element faces a direction same as the onemain surface of the insulating layer, an upper electrode provided on theupper surface of the semiconductor element; a wiring member that has oneend electrically bonded to the upper electrode of the semiconductorelement and has another end electrically bonded to the conductive layer,and has a hollow portion; a first sealing material; and a second sealingmaterial, wherein the first sealing material seals at least part of thesemiconductor element so as to be in contact with the semiconductorelement, the second sealing material seals the wiring member so as to bein contact with the wiring member, the first sealing material is anepoxy resin, and the second sealing material is silicone gel, thesemiconductor device further comprising a heat dissipation plate,wherein another main surface of the insulating layer is bonded to onemain surface of the heat dissipation plate, an opening where the heatdissipation plate is not covered with the insulating layer is providedin the one main surface of the heat dissipation plate, a lower surfaceof the semiconductor element is bonded to the one main surface of theheat dissipation plate in the opening, the first sealing material sealsat least part of the semiconductor element and the opening, the firstsealing material seals part of the semiconductor element so as not to bein contact with the upper surface of the semiconductor element, and thesecond sealing material seals one end and another end of the wiringmember.
 33. The semiconductor device according to claim 32, wherein thefirst sealing material seals at least part of the semiconductor elementso as not to be in contact with the hollow portion of the wiring member,and the second sealing material is in contact with a whole of the hollowportion of the wiring member.
 34. The semiconductor device according toclaim 32, wherein the semiconductor element has a rectangular shape inplan view, the first sealing material seals four corners of thesemiconductor element, and the first sealing material is formed to bediscrete in each of the four corners of the semiconductor element. 35.The semiconductor device according to claim 32, the semiconductor devicefurther comprising a bonding material that bonds the semiconductorelement and the heat dissipation plate, wherein the semiconductorelement has a rectangular shape in plan view, the first sealing materialseals four corners of the semiconductor element, the bonding material isprovided such that, of two pairs of sides facing each other in plan viewof the semiconductor element, a thickness of the bonding material, onone side of a pair of shorter sides facing each other, is smaller than athickness of the bonding material on another side of the pair, and thefirst sealing material is provided such that a formation amount of thefirst sealing material in each of two corners on the one side of thepair is larger than a formation amount of the first sealing material ineach of two corners on the other side of the pair.
 36. The semiconductordevice according to claim 32, wherein the semiconductor element has arectangular shape in plan view, the first sealing material seals fourcorners of the semiconductor element, and the first sealing materialextends, of two pairs of sides facing each other in plan view of thesemiconductor element, along any one of the two pairs of sides facingeach other.
 37. The semiconductor device according to claim 36, whereinthe first sealing material extends, of two pairs of sides facing eachother in plan view of the semiconductor element, along a pair of shortersides facing each other.
 38. The semiconductor device according to claim36, wherein the first sealing material extends, of two pairs of sidesfacing each other in plan view of the semiconductor element, along apair of longer sides facing each other.
 39. The semiconductor deviceaccording to claim 22, wherein the semiconductor element is an elementthat amplifies or switches a high frequency signal.
 40. Thesemiconductor device according to claim 39, wherein a material of thesemiconductor element is a wide bandgap semiconductor.
 41. A method formanufacturing a semiconductor device comprising the steps of: (a)preparing a base substrate including an insulating layer and aconductive layer bonded to one main surface of the insulating layer; (b)arranging a semiconductor element such that an upper surface of thesemiconductor element faces a direction same as the one main surface ofthe insulating layer, an upper electrode being provided on the uppersurface of the semiconductor element; (c) bonding one end of a wiringmember to the upper electrode of the semiconductor element and bondinganother end of the wiring member to the conductive layer; (d) after thestep (c), by a first sealing material, sealing at least part of thesemiconductor element so as to be in contact with the semiconductorelement; and (e) after the step (d), by a second sealing material,sealing the wiring member so as to be in contact with the wiring member,wherein the first sealing material is an epoxy resin, and the secondsealing material is silicone gel.